Search for: All records

Printed electronics have made remarkable progress in recent years and inkjet printing (IJP) has emerged as one of the leading methods for fabricating printed electronic devices. However, challenges such as nozzle clogging, and strict ink formulation constraints have limited their widespread use. To address this issue, a novel nozzle‐free printing technology is explored, which is enabled by laser‐generated focused ultrasound, as a potential alternative printing modality called Shock‐wave Jet Printing (SJP). Specifically, the performance of SJP‐printed and IJP‐printed bottom‐gated carbon nanotube (CNT) thin film transistors (TFTs) is compared. While IJP required ten print passes to achieve fully functional devices with channel dimensions ranging from tens to hundreds of micrometers, SJP achieved comparable performance with just a single pass. For optimized devices, SJP demonstrated six times higher maximum mobility than IJP‐printed devices. Furthermore, the advantages of nozzle‐free printing are evident, as SJP successfully printed stored and unsonicated inks, delivering moderate electrical performance, whereas IJP suffered from nozzle clogging due to CNT agglomeration. Moreover, SJP can print significantly longer CNTs, spanning the entire range of tube lengths of commercially available CNT ink. The findings from this study contribute to the advancement of nanomaterial printing, ink formulation, and the development of cost‐effective printable electronics.

 

High‐quality‐factor microring resonators are highly desirable in many applications. Fabricating a microring resonator typically requires delicate instruments to ensure a smooth side wall of waveguides and 100‐nm critical feature size in the coupling region. In this work, a new method “damascene soft nanoimprinting lithography” is demonstrated that can create high‐fidelity waveguide by simply backfilling an imprinted cladding template with a high refractive index polymer core. This method can easily realize high Q‐factor polymer microring resonators (e.g., ≈5 × 10⁵around 770 nm wavelength) without the use of any expensive instruments and can be conducted in a normal lab environment. The high Q‐factors can be attributed to the residual layer‐free feature and controllable meniscus cross‐section profile of the filled polymer core. Furthermore, the new method is compatible with different polymers, yields low fabrication defects, enables new functionalities, and allows flexible substrate. These benefits can broaden the applicability of the fabricated microring resonator.

 

We have developed a single-step, high-throughput methodology to selectively confine submicron particles of a specific size into sequentially inscribed nanovoid patterns by utilizing electrostatic and entropic particle-void interactions in an ionic solution. The nanovoid patterns can be rendered positively charged by coating with an aluminum oxide layer, which can then localize negatively charged particles of a specific size into ordered arrays defined by the nanovoid topography. Based on the Poisson-Boltzmann model, the size-selective localization of particles in the voids is directed by the interplay between particle-nanovoid geometry, electrostatic interactions, and ionic entropy change induced by charge regulation in the electrical double layer overlapping region. The underlying principle and developed method could potentially be extended to size-selective trapping, separation, and patterning of many other objects including biological structures. 

Nanoimprinting has been applied in many micro- and nanoscale engineered devices; applications include displays, organic electronics, photovoltaics, optical films, and optoelectronics; and in some cases, direct imprinting of functional polymeric devices. Applications in the photonics area can significantly relieve the stringent requirement needed for nanoelectronics. We provide examples of structural colors and optical meta-surfaces facilitated by nanoimprinting, as well as plasmonic lithography masks that can produce deep-subwavelength structures using ordinary UV light. Inkjet printing has been widely used in many applications, but still faces challenges in pattern precision and feature variations. Combining Nanoimprint for patterning and inkjet printing for material deposition will take the advantage of what both technologies can offer, and can provide a high precision additive manufacturing process. We will show printed photonic devices, e.g. electro-optic polymer based optical modulators. To extend nanoimprinting to solid materials other than polymeric films will require innovative and non-conventional approaches. One such process is Metal-assisted chemical (Mac) imprint, which combines MacEtch and nanoiprint and enables direct MacEtch of Si substrate using a hybrid imprinting mold having noble metal mask. However, only low aspect ratio structures have been obtained because of the mass-transport limitation in the previous molds. Recently we effectively solved this problem by a using a specially made mold of Pt-coated anodized aluminum oxide (AAO) membrane, where the holes through the entire thickness drastically enhances the mass-transport. As a result, very high aspect ratio Si nanowires were achieved by MacImprint.